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Michael E. Coltrin
Michael E. Coltrin
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Bestätigte E-Mail-Adresse bei sandia.gov
Titel
Zitiert von
Zitiert von
Jahr
A Fortran computer code package for the evaluation of gas-phase multicomponent transport properties
RJ Kee, G Dixon-Lewis, J Warnatz, ME Coltrin, JA Miller
Sandia National Laboratories Report SAND86-8246 13, 80401-1887, 1986
13991986
Chemically reacting flow: theory and practice
RJ Kee, ME Coltrin, P Glarborg
John Wiley & Sons, 2005
10732005
Ultrawide‐bandgap semiconductors: research opportunities and challenges
JY Tsao, S Chowdhury, MA Hollis, D Jena, NM Johnson, KA Jones, ...
Advanced Electronic Materials 4 (1), 1600501, 2018
7942018
A mathematical model of the coupled fluid mechanics and chemical kinetics in a chemical vapor deposition reactor
ME Coltrin, RJ Kee, JA Miller
Journal of the Electrochemical Society 131 (2), 425, 1984
5131984
CHEMKIN collection, release 3.6, reaction design
RJ Kee, FM Rupley, JA Miller, ME Coltrin, JF Grcar, E Meeks, HK Moffat, ...
Inc., San Diego, CA 20 (0), 0, 2000
4632000
Research challenges to ultra‐efficient inorganic solid‐state lighting
JM Phillips, ME Coltrin, MH Crawford, AJ Fischer, MR Krames, ...
Laser & Photonics Reviews 1 (4), 307-333, 2007
4292007
CHEMKIN Release 4.1
RJ Kee, FM Rupley, JA Miller, ME Coltrin, JF Grcar, E Meeks, HK Moffat, ...
Reaction Design, San Diego, CA, 2006
4012006
A mathematical model of silicon chemical vapor deposition: further refinements and the effects of thermal diffusion
ME Coltrin, RJ Kee, JA Miller
Journal of The Electrochemical Society 133 (6), 1206, 1986
3721986
A new tunneling path for reactions such as H+H2→H2+H
RA Marcus, ME Coltrin
The Journal of Chemical Physics 67 (6), 2609-2613, 1977
3711977
A mathematical model of the fluid mechanics and gas‐phase chemistry in a rotating disk chemical vapor deposition reactor
ME Coltrin, RJ Kee, GH Evans
Journal of the Electrochemical Society 136 (3), 819, 1989
3561989
Toward smart and ultra‐efficient solid‐state lighting
JY Tsao, MH Crawford, ME Coltrin, AJ Fischer, DD Koleske, ...
Advanced Optical Materials 2 (9), 809-836, 2014
3282014
Surface chemkin-iii: A fortran package for analyzing heterogeneous chemical kinetics at a solid-surface-gas-phase interface
ME Coltrin, RJ Kee, FM Rupley, E Meeks
Sandia National Lab.(SNL-NM), Albuquerque, NM (United States), 1996
2651996
Reactive sticking coefficients for silane and disilane on polycrystalline silicon
RJ Buss, P Ho, WG Breiland, ME Coltrin
Journal of Applied Physics 63 (8), 2808-2819, 1988
2421988
A model of elementary chemistry and fluid mechanics in the combustion of hydrogen on platinum surfaces
J Warnatz, MD Allendorf, RJ Kee, ME Coltrin
Combustion and Flame 96 (4), 393-406, 1994
2371994
A theoretical study of the heats of formation of silicon hydride (SiHn), silicon chloride (SiCln), and silicon hydride chloride (SiHnClm) compounds
P Ho, ME Coltrin, JS Binkley, CF Melius
The Journal of Physical Chemistry 89 (21), 4647-4654, 1985
2321985
A Fortran computer code package for the evaluation of gas-phase multicomponent transport properties, Report No
RJ Kee, G Dixon-Lewis, J Warnatz, ME Coltrin, JA Miller, HK Moffat
SAND86-8246, Sandia National Laboratories, 1996
2231996
Solid-state lighting: an energy-economics perspective
JY Tsao, HD Saunders, JR Creighton, ME Coltrin, JA Simmons
Journal of Physics D: Applied Physics 43 (35), 354001, 2010
2222010
Analysis of diamond growth in subatmospheric dc plasma‐gun reactors
ME Coltrin, DS Dandy
Journal of Applied Physics 74 (9), 5803-5820, 1993
2041993
Modeling the thermal DENOx process in flow reactors. Surface effects and Nitrous Oxide formation
P Glarborg, K Dam‐Johansen, JA Miller, RJ Kee, ME Coltrin
International Journal of Chemical Kinetics 26 (4), 421-436, 1994
1991994
Surface chemkin: A general formalism and software for analyzing heterogeneous chemical kinetics at a gas‐surface interface
ME Coltrin, RJ Kee, FM Rupley
International Journal of Chemical Kinetics 23 (12), 1111-1128, 1991
1921991
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