Martha Sanchez
Martha Sanchez
IBM
Bestätigte E-Mail-Adresse bei pacbell.net
Titel
Zitiert von
Zitiert von
Jahr
Liquid immersion deep-ultraviolet interferometric lithography
JA Hoffnagle, WD Hinsberg, M Sanchez, FA Houle
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1999
6791999
Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance
W Hinsberg, FA Houle, J Hoffnagle, M Sanchez, G Wallraff, M Morrison, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1998
2131998
Modeling line edge roughness effects in sub 100 nanometer gate length devices
P Oldiges, Q Lin, K Petrillo, M Sanchez, M Ieong, M Hargrove
2000 International Conference on Simulation Semiconductor Processes and …, 2000
1972000
Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists
WD Hinsberg, FA Houle, MI Sanchez, GM Wallraff
IBM Journal of Research and Development 45 (5), 667-682, 2001
1592001
Nanoporous polyimides derived from highly fluorinated polyimide/poly (propylene oxide) copolymers
KR Carter, RA DiPietro, MI Sanchez, SA Swanson
Chemistry of materials 13 (1), 213-221, 2000
1542000
Determination of coupled acid catalysis-diffusion processes in a positive-tone chemically amplified photoresist
FA Houle, WD Hinsberg, M Morrison, MI Sanchez, G Wallraff, C Larson, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000
1522000
Polyimides derived from nonaromatic monomers: synthesis, characterization and potential applications
W Volksen, HJ Cha, MI Sanchez, DY Yoon
Reactive and Functional Polymers 30 (1-3), 61-69, 1996
1111996
Carbon nanotube scanning probe for profiling of deep-ultraviolet and 193 nm photoresist patterns
CV Nguyen, RMD Stevens, J Barber, J Han, M Meyyappan, MI Sanchez, ...
Applied Physics Letters 81 (5), 901-903, 2002
962002
Aerial image contrast using interferometric lithography: effect on line-edge roughness
MI Sanchez, WD Hinsberg, FA Houle, JA Hoffnagle, H Ito, CV Nguyen
Advances in Resist Technology and Processing XVI 3678, 160-171, 1999
921999
Fast model-based optical proximity correction
AE Rosenbluth, GM Gallatin, RL Gordon, N Seong, AY Lvov, ...
US Patent 7,079,223, 2006
902006
Extendibility of chemically amplified resists: another brick wall?
WD Hinsberg, FA Houle, MI Sanchez, JA Hoffnagle, GM Wallraff, ...
Advances in Resist Technology and Processing XX 5039, 1-14, 2003
872003
Effect of resist components on image spreading during postexposure bake of chemically amplified resists
WD Hinsberg, FA Houle, MI Sanchez, ME Morrison, GM Wallraff, ...
Advances in Resist Technology and Processing XVII 3999, 148-160, 2000
852000
Liquid immersion lithography: evaluation of resist issues
W Hinsberg, GM Wallraff, CE Larson, BW Davis, V Deline, S Raoux, ...
Advances in Resist Technology and Processing XXI 5376, 21-33, 2004
772004
High-temperature polyimide nanofoams for microelectronic applications
JL Hedrick, KR Carter, HJ Cha, CJ Hawker, RA DiPietro, JW Labadie, ...
Reactive and Functional Polymers 30 (1-3), 43-53, 1996
751996
High-NA lithographic imagery at Brewster's angle
TA Brunner, N Seong, WD Hinsberg, JA Hoffnagle, FA Houle, MI Sanchez
Optical Microlithography XV 4691, 1-10, 2002
722002
Influence of resist components on image blur in a patterned positive-tone chemically amplified photoresist
FA Houle, WD Hinsberg, MI Sanchez, JA Hoffnagle
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002
692002
Kinetic model for positive tone resist dissolution and roughening
FA Houle, WD Hinsberg, MI Sanchez
Macromolecules 35 (22), 8591-8600, 2002
672002
Polyimide nanofoams based on ordered polyimides derived from poly (amic alkyl esters): PMDA/4-BDAF
KR Carter, RA DiPietro, MI Sanchez, TP Russell, P Lakshmanan, ...
Chemistry of materials 9 (1), 105-118, 1997
661997
Polyimide nanofoams from caprolactone-based copolymers
JL Hedrick, TP Russell, M Sanchez, R DiPietro, S Swanson, ...
Macromolecules 29 (10), 3642-3646, 1996
501996
Method of measuring the spatial resolution of a photoresist
JA Hoffnagle, WD Hinsberg, MI Sanchez, FA Houle
Optics letters 27 (20), 1776-1778, 2002
492002
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