Wei-Kan Chu
Wei-Kan Chu
Cullen Professor of Physics, University of Houston
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Zitiert von
Zitiert von
Backscattering spectrometry
WK Chu
Elsevier, 2012
Application of the topographic position index to heterogeneous landscapes
J De Reu, J Bourgeois, M Bats, A Zwertvaegher, V Gelorini, P De Smedt, ...
Geomorphology 186, 39-49, 2013
Principles and applications of ion beam techniques for the analysis of solids and thin films
WK Chu, JW Mayer, MA Nicolet, TM Buck, G Amsel, F Eisen
Thin Solid Films 17 (1), 1-41, 1973
Calculation of energy straggling for protons and helium ions
WK Chu
Physical Review A 13 (6), 2057, 1976
Implanted noble gas atoms as diffusion markers in silicide formation
WK Chu, SS Lau, JW Mayer, H Müller, KN Tu
Thin Solid Films 25 (2), 393-402, 1975
Structure and growth kinetics of Ni2Si on silicon
KN Tu, WK Chu, JW Mayer
Thin Solid Films 25 (2), 403-413, 1975
Profiling hydrogen in materials using ion beams
JF Ziegler, CP Wu, P Williams, CW White, B Terreault, BMU Scherzer, ...
nuclear instruments and methods 149 (1-3), 19-39, 1978
Epitaxial ferroelectric thin films for room-temperature tunable element applications
CL Chen, HH Feng, Z Zhang, A Brazdeikis, ZJ Huang, WK Chu, CW Chu, ...
Applied physics letters 75 (3), 412-414, 1999
Superconductor and magnet levitation devices
KB Ma, YV Postrekhin, WK Chu
Review of Scientific Instruments 74 (12), 4989-5017, 2003
Stopping cross sections and backscattering factors for 4He ions in matter Z= 1–92, E (4He)= 400–4000 keV
JF Ziegler, WK Chu
Atomic Data and Nuclear Data Tables 13 (5), 463-489, 1974
Alpha-particle stopping cross section in solids from 400 kev to 2 mev
WK Chu, D Powers
Physical Review 187 (2), 478, 1969
Method for manufacture of ultra-thin film capacitor
A Bhattacharyya, WK Chu, JK Howard, FW Wiedman
US Patent 4,333,808, 1982
Comparative study of CdS thin films deposited by single, continuous, and multiple dip chemical processes
IO Oladeji, L Chow, JR Liu, WK Chu, ANP Bustamante, C Fredricksen, ...
Thin Solid Films 359 (2), 154-159, 2000
Identification of the dominant diffusing species in silicide formation
WK Chu, H Kraütle, JW Mayer, H Müller, MA Nicolet, KN Tu
Applied Physics Letters 25 (8), 454-457, 1974
Transient enhanced diffusion during rapid thermal annealing of boron implanted silicon
K Cho, M Numan, TG Finstad, WK Chu, J Liu, JJ Wortman
Applied physics letters 47 (12), 1321-1323, 1985
Stopping Cross Sections of Gases for α Particles from 0.3 to 2 MeV
PD Bourland, WK Chu, D Powers
Physical Review B 3 (11), 3625, 1971
Reactive ion etching of diamond
GS Sandhu, WK Chu
Applied physics letters 55 (5), 437-438, 1989
Negative transconductance and negative differential resistance in a grid‐gate modulation‐doped field‐effect transistor
K Ismail, W Chu, A Yen, DA Antoniadis, HI Smith
Applied physics letters 54 (5), 460-462, 1989
Optimization of the germanium preamorphization conditions for shallow-junction formation
MC Ozturk, JJ Wortman, CM Osburn, A Ajmera, GA Rozgonyi, E Frey, ...
IEEE Transactions on Electron Devices 35 (5), 659-668, 1988
Calculation of mean excitation energy for all elements
WK Chu, D Powerd
Physics Letters A 40 (1), 23-24, 1972
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