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Katie Pickrahn Nardi
Katie Pickrahn Nardi
Lam Research, Stanford University
Bestätigte E-Mail-Adresse bei stanford.edu
Titel
Zitiert von
Zitiert von
Jahr
Active MnOx Electrocatalysts Prepared by Atomic Layer Deposition for Oxygen Evolution and Oxygen Reduction Reactions
KL Pickrahn, SW Park, Y Gorlin, HBR Lee, TF Jaramillo, SF Bent
Advanced Energy Materials 2 (10), 1269-1277, 2012
3502012
Creating highly active atomic layer deposited NiO electrocatalysts for the oxygen evolution reaction
KL Nardi, N Yang, CF Dickens, AL Strickler, SF Bent
Advanced Energy Materials 5 (17), 1500412, 2015
2612015
Nanoengineering and interfacial engineering of photovoltaics by atomic layer deposition
JR Bakke, KL Pickrahn, TP Brennan, SF Bent
Nanoscale 3 (9), 3482-3508, 2011
2072011
Methods for making euv patternable hard masks
C Wu, TW Weidman, KL Nardi
US Patent App. 15/733,598, 2021
1852021
Area-selective atomic layer deposition assisted by self-assembled monolayers: A comparison of Cu, Co, W, and Ru
D Bobb-Semple, KL Nardi, N Draeger, DM Hausmann, SF Bent
Chemistry of Materials 31 (5), 1635-1645, 2019
1672019
Nanoscale limitations in metal oxide electrocatalysts for oxygen evolution
V Viswanathan, KL Pickrahn, AC Luntz, SF Bent, JK Nørskov
Nano letters 14 (10), 5853-5857, 2014
772014
Improving area-selective molecular layer deposition by selective SAM removal
C Prasittichai, KL Pickrahn, FS Minaye Hashemi, DS Bergsman, SF Bent
ACS Applied Materials & Interfaces 6 (20), 17831-17836, 2014
642014
Applications of ALD MnO to electrochemical water splitting
KL Pickrahn, Y Gorlin, LC Seitz, A Garg, D Nordlund, TF Jaramillo, ...
Physical Chemistry Chemical Physics 17 (21), 14003-14011, 2015
572015
Effect of O3 on Growth of Pt by Atomic Layer Deposition
HBR Lee, KL Pickrahn, SF Bent
The Journal of Physical Chemistry C 118 (23), 12325-12332, 2014
522014
ALD of ultrathin ternary oxide electrocatalysts for water splitting
KL Pickrahn, A Garg, SF Bent
ACS Catalysis 5 (3), 1609-1616, 2015
462015
Formation and ripening of self-assembled multilayers from the vapor-phase deposition of dodecanethiol on copper oxide
DS Bergsman, TL Liu, RG Closser, KL Nardi, N Draeger, DM Hausmann, ...
Chemistry of materials 30 (16), 5694-5703, 2018
452018
Effect of Multilayer versus Monolayer Dodecanethiol on Selectivity and Pattern Integrity in Area-Selective Atomic Layer Deposition
TL Liu, KL Nardi, N Draeger, DM Hausmann, SF Bent
ACS Applied Materials & Interfaces 12 (37), 42226-42235, 2020
322020
Relationship between microstructure, dynamics, and rheology in polymer-bridging colloidal gels
K Pickrahn, B Rajaram, A Mohraz
Langmuir 26 (4), 2392-2400, 2010
322010
Characterizing self-assembled monolayer breakdown in area-selective atomic layer deposition
TL Liu, L Zeng, KL Nardi, DM Hausmann, SF Bent
Langmuir 37 (39), 11637-11645, 2021
212021
Lithographic performance of the first entirely dry process for EUV lithography
M Alvi, D Dries, R Gottscho, K Gu, B Kam, S Kanakasabapathy, D Li, ...
EUVL Workshop, 2020
52020
Interface engineering during MGO deposition for magnetic tunnel junctions
KL Nardi, NS Draeger
US Patent 9,988,715, 2018
22018
Methods for making hard masks useful in next-generation lithography
TW Weidman, K Nardi, C Wu
US Patent 11,921,427, 2024
12024
Selective etch using a sacrificial mask
D Peter, D Li, J Yu, A Kabansky, K Nardi, SSH Tan, Y Lee
US Patent App. 17/428,560, 2022
2022
(Invited) Challenges and Opportunities for Selective Area Processing in High Volume Manufacturing (HVM)
K Sharma, P Lemaire, K Nardi, D Hausmann
Electrochemical Society Meeting Abstracts 236, 1140-1140, 2019
2019
Approaches to atomic-scale engineering through selective processes
K Nardi, N Draeger, D Hausmann, D Smith
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY 255, 2018
2018
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