| A maximum likelihood approach to the inverse problem of scatterometry MA Henn, H Gross, F Scholze, M Wurm, C Elster, M Bär Optics Express 20 (12), 12771-12786, 2012 | 61 | 2012 |
| Measurements of CD and sidewall profile of EUV photomask structures using CD-AFM and tilting-AFM G Dai, K Hahm, F Scholze, MA Henn, H Gross, J Fluegge, H Bosse Measurement Science and Technology 25 (4), 044002, 2014 | 57 | 2014 |
| Modeling of line roughness and its impact on the diffraction intensities and the reconstructed critical dimensions in scatterometry H Gross, MA Henn, S Heidenreich, A Rathsfeld, M Bär Berlin: Weierstraß-Institut für Angewandte Analysis und Stochastik, 2012 | 52 | 2012 |
| Deep subwavelength nanometric image reconstruction using Fourier domain optical normalization J Qin, RM Silver, BM Barnes, H Zhou, RG Dixson, MA Henn Light: Science & Applications 5 (2), e16038-e16038, 2016 | 47 | 2016 |
| Improved reconstruction of critical dimensions in extreme ultraviolet scatterometry by modeling systematic errors MA Henn, H Gross, S Heidenreich, F Scholze, C Elster, M Baer Measurement Science and Technology 25 (4), 044003, 2014 | 30 | 2014 |
| Improved grating reconstruction by determination of line roughness in extreme ultraviolet scatterometry MA Henn, S Heidenreich, H Gross, A Rathsfeld, F Scholze, M Bär Optics Letters 37 (24), 5229-5231, 2012 | 29 | 2012 |
| First steps towards a scatterometry reference standard B Bodermann, PE Hansen, S Burger, MA Henn, H Gross, M Bär, ... Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and …, 2012 | 21 | 2012 |
| A surrogate model enables a Bayesian approach to the inverse problem of scatterometry S Heidenreich, H Gross, MA Henn, C Elster, M Bär Journal of Physics: Conference Series 490 (1), 012007, 2014 | 19 | 2014 |
| Optimizing hybrid metrology: rigorous implementation of Bayesian and combined regression MA Henn, RM Silver, JS Villarrubia, NF Zhang, H Zhou, BM Barnes, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 14 (4), 044001, 2015 | 17 | 2015 |
| Modelling line edge roughness in periodic line-space structures by Fourier optics to improve scatterometry H Gross, S Heidenreich, MA Henn, G Dai, F Scholze, M Bär Journal of the European Optical Society-Rapid publications 9, 14003, 2014 | 17 | 2014 |
| Combining model-based measurement results of critical dimensions from multiple tools NF Zhang, BM Barnes, H Zhou, MA Henn, RM Silver Measurement Science and Technology 28 (6), 065002, 2017 | 15 | 2017 |
| Data-driven approaches to optical patterned defect detection MA Henn, H Zhou, BM Barnes OSA continuum 2 (9), 2683-2693, 2019 | 11 | 2019 |
| Assessing form-dependent optical scattering at vacuum-and extreme-ultraviolet wavelengths of nanostructures with two-dimensional periodicity BM Barnes, MA Henn, MY Sohn, H Zhou, RM Silver Physical Review Applied 11 (6), 064056, 2019 | 11 | 2019 |
| Optimizing image-based patterned defect inspection through FDTD simulations at multiple ultraviolet wavelengths BM Barnes, H Zhou, MA Henn, MY Sohn, RM Silver Modeling Aspects in Optical Metrology VI 10330, 192-206, 2017 | 11 | 2017 |
| Measurement comparison of goniometric scatterometry and coherent Fourier scatterometry J Endres, N Kumar, P Petrik, MA Henn, S Heidenreich, SF Pereira, ... Optical Micro-and Nanometrology V 9132, 39-47, 2014 | 10 | 2014 |
| Comparison of CD measurements of an EUV photomask by EUV scatterometry and CD-AFM F Scholze, V Soltwisch, G Dai, MA Henn, H Gross Photomask Technology 2013 8880, 68-79, 2013 | 10 | 2013 |
| On numerical reconstructions of lithographic masks in DUV scatterometry MA Henn, R Model, M Bär, M Wurm, B Bodermann, A Rathsfeld, H Gross Modeling Aspects in Optical Metrology II 7390, 247-257, 2009 | 10 | 2009 |
| Improving model-based MPI image reconstructions: Baseline recovery, receive coil sensitivity, relaxation and uncertainty estimation MA Henn, KN Quelhas, T Bui, S Woods International Journal on Magnetic Particle Imaging IJMPI 8 (1), 2022 | 9 | 2022 |
| Applications of machine learning at the limits of form-dependent scattering for defect metrology MA Henn, H Zhou, RM Silver, BM Barnes Metrology, Inspection, and Process Control for Microlithography XXXIII 10959 …, 2019 | 9 | 2019 |
| Novel mathematical and statistical approaches to uncertainty evaluation: best practice guide to uncertainty evaluation for computationally expensive models K Rasmussen, JB Kondrup, A Allard, S Demeyer, N Fischer, E Barton, ... Euramet: Brunswick, Germany, 2015 | 9 | 2015 |
