Mann-Ho Cho
Mann-Ho Cho
Department of Physics, Yonsei University
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Zitiert von
Zitiert von
Thermal stability and structural characteristics of films on Si (100) grown by atomic-layer deposition
MH Cho, YS Roh, CN Whang, K Jeong, SW Nahm, DH Ko, JH Lee, NI Lee, ...
Applied physics letters 81 (3), 472-474, 2002
The breakthrough in data retention time of DRAM using Recess-Channel-Array Transistor (RCAT) for 88 nm feature size and beyond
JY Kim, CS Lee, SE Kim, IB Chung, YM Choi, BJ Park, JW Lee, DI Kim, ...
2003 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No …, 2003
Interfacial characteristics of grown on nitrided Ge (100) substrates by atomic-layer deposition
H Kim, PC McIntyre, CO Chui, KC Saraswat, MH Cho
Applied physics letters 85 (14), 2902-2904, 2004
Improved Growth Behavior of Atomic-Layer-Deposited High-k Dielectrics on Multilayer MoS2 by Oxygen Plasma Pretreatment
J Yang, S Kim, W Choi, SH Park, Y Jung, MH Cho, H Kim
ACS applied materials & interfaces 5 (11), 4739-4744, 2013
Dielectric characteristics of nanolaminates on Si(100)
MH Cho, YS Roh, CN Whang, K Jeong, HJ Choi, SW Nam, DH Ko, ...
Applied physics letters 81 (6), 1071-1073, 2002
Epitaxial growth of films on Si(100) without an interfacial oxide layer
SC Choi, MH Cho, SW Whangbo, CN Whang, SB Kang, SI Lee, MY Lee
Applied physics letters 71 (7), 903-905, 1997
Effect of polysilicon gate on the flatband voltage shift and mobility degradation for ALD-Al/sub 2/O/sub 3/gate dielectric
JH Lee, K Koh, NI Lee, MH Cho, YK Ki, JS Jeon, KH Cho, HS Shin, ...
International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No …, 2000
High concentration of nitrogen doped into graphene using N 2 plasma with an aluminum oxide buffer layer
SH Park, J Chae, MH Cho, JH Kim, KH Yoo, SW Cho, TG Kim, JW Kim
Journal of Materials Chemistry C 2 (5), 933-939, 2014
Band gap and band offsets for ultrathin dielectric films on Si (100)
H Jin, SK Oh, HJ Kang, MH Cho
Applied physics letters 89 (12), 122901, 2006
Characteristics of thin films grown by plasma atomic layer deposition
J Kim, S Kim, H Jeon, MH Cho, KB Chung, C Bae
Applied Physics Letters 87 (5), 053108, 2005
Change in the chemical state and thermal stability of by the incorporation of
MH Cho, HS Chang, YJ Cho, DW Moon, KH Min, R Sinclair, SK Kang, ...
Applied physics letters 84 (4), 571-573, 2004
Changes in the electronic structures and optical band gap of and N-doped during phase transition
YK Kim, K Jeong, MH Cho, U Hwang, HS Jeong, K Kim
Applied physics letters 90 (17), 171920, 2007
MoS2–InGaZnO Heterojunction Phototransistors with Broad Spectral Responsivity
J Yang, H Kwak, Y Lee, YS Kang, MH Cho, JH Cho, YH Kim, SJ Jeong, ...
ACS applied materials & interfaces 8 (13), 8576-8582, 2016
Structural transition of crystalline Y2O3 film on Si (111) with substrate temperature
MH Cho, DH Ko, K Jeong, SW Whangbo, CN Whang, SC Choi, SJ Cho
Thin Solid Films 349 (1-2), 266-269, 1999
Growth stage of crystalline film on Si(100) grown by an ionized cluster beam deposition
MH Cho, DH Ko, K Jeong, SW Whangbo, CN Whang, SC Choi, SJ Cho
Journal of applied physics 85 (5), 2909-2914, 1999
Study of thin films for gate oxide applications
SW Nam, JH Yoo, HY Kim, SK Kang, DH Ko, CW Yang, HJ Lee, MH Cho, ...
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 19 (4 …, 2001
The electronic structure of C60/ZnPc interface for organic photovoltaic device with blended layer architecture
SH Park, JG Jeong, HJ Kim, SH Park, MH Cho, SW Cho, Y Yi, MY Heo, ...
Applied Physics Letters 96 (1), 2, 2010
Interfacial characteristics of films grown on strained by atomic-layer deposition
MH Cho, HS Chang, DW Moon, SK Kang, BK Min, DH Ko, HS Kim, ...
Applied physics letters 84 (7), 1171-1173, 2004
Wafer-scale synthesis of thickness-controllable MoS 2 films via solution-processing using a dimethylformamide/n-butylamine/2-aminoethanol solvent system
J Yang, Y Gu, E Lee, H Lee, SH Park, MH Cho, YH Kim, YH Kim, H Kim
Nanoscale 7 (20), 9311-9319, 2015
Terahertz single conductance quantum and topological phase transitions in topological insulator Bi 2 Se 3 ultrathin films
BC Park, TH Kim, KI Sim, B Kang, JW Kim, B Cho, KH Jeong, MH Cho, ...
Nature communications 6 (1), 1-8, 2015
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